Environmentally friendly water-soluble resists via chemical amplification.
نویسندگان
چکیده
منابع مشابه
Chemical Amplification Resists for Future Lithography
The technologies for future lithography have been proposed, such as i-line phase-shifting lithography, deep-UV lithography and electron beam lithography. We have proposed several types of chemical amplification resist systems for future lithography. These are based on the change in dissolution rate by acid catalyzed reaction for aqueous development: dissolution inhibitor to dissolution promoter...
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ژورنال
عنوان ژورنال: Journal of Photopolymer Science and Technology
سال: 1995
ISSN: 0914-9244,1349-6336
DOI: 10.2494/photopolymer.8.173